The Asia University team visited the Hsinchu Campus of the **National Instrument Center (NIC)** on October 23, 2025. They were personally received by Director Pan Cheng-Tang, and several executives and engineers accompanied the tour. The main purpose of the visit was to exchange views and observe the **Atomic Layer Deposition (ALD)** equipment and related advanced process technologies, exploring possibilities for future collaboration and technology introduction.

       Attendees from Asia University included Associate Professor Peng Yu-Ming and Assistant Professor Cho Yun-Shao, among others. The team gained a hands-on understanding of the NIC's ALD system architecture, process features, and application directions. They also exchanged opinions on topics such as equipment specifications, funding planning, and implementation timelines. This visit serves as a critical preliminary evaluation for Asia University's planned ALD equipment acquisition in **Academic Year 115** (2026), aiming to promote research and development in the fields of semiconductors and advanced materials within the university.

       Director Pan Cheng-Tang expressed that NIC will continue to promote cooperation and technical exchange among academic and research units, and welcomes Asia University faculty and students to participate in future technical visits and research sharing activities. Both parties also discussed the possibility of jointly holding technical seminars and specialized courses to facilitate the integration of industry-academia-research resources and talent cultivation collaboration.

Figure: The Asia University team visits and exchanges views at the National Instrument Center, Hsinchu Campus.

       This visit not only deepened the connection between Asia University and NIC but also opened new opportunities for future advanced process research and equipment collaboration, demonstrating AU's continuous efforts in strengthening its scientific research foundation and promoting cross-disciplinary technological development.